On OH production in water containing atmospheric pressure plasmas

Plasma Sources Science and Technology

Volumn 19, Issue 4, 2010, Pages

  Bruggeman, Peter ^a   Schram, Daan C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC IONIZATION; ATMOSPHERIC PRESSURE; FREE RADICALS; GLOW DISCHARGES; PHOTODISSOCIATION; PLASMA DIAGNOSTICS;

ATMOSPHERIC PRESSURE PLASMAS; DISSOCIATIVE RECOMBINATIONS; IONIZATION DEGREE; LOW PRESSURE GAS; NEUTRAL SPECIES; PLASMA PROPERTIES; RADICAL PRODUCTION; THERMAL DISSOCIATION;

ELECTRON TEMPERATURE;

EID: 85043639326     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/19/4/045025     Document Type: Article

References (54)

1. Liu D X, Bruggeman P, Iza F, Rong M Z and Kong M G 2010 Plasma Sources Sci. Technol. 19 025018
2. Schram D C 2009 Plasma Sources Sci. Technol. 18 014003
3. Creyghton Y L M, van Veldhuizen E M and Rutgers W R 1994 IEE Proc. Sci. Meas. Technol. 141 141-7
4. Marode E 1975 J. Appl. Phys. 46 2005
5. Spyrou N, Held B, Peyrous R, Manassis Ch and Pignolet P 1992 J. Phys. D: Appl. Phys. 25 211
6. Liu N, Celestin S, Bourdon A and Pasko V P 2007 Appl. Phys. Lett. 91 211501
7. van der Mullen J J A M, van de Sande M J, de Vries N, Broks B, Iordanova E, Gamero A, Torres J and Sola A 2007 Spectrochim. Acta B 62 1135-46
8. Boulos M I, Fauchais P and Pfender E 1994 Thermal Plasmas: Fundamentals and Applications (New York: Plenum)
9. Balcon N, Aanesland A and Boswell R 2007 Plasma Sources Sci. Technol. 16 217-25
10. Dong L, Qi Y, Zhao Z and Li Y 2008 Plasma Sources Sci. Technol. 17 015015
11. Zhu X M, Pu Y K, Balcon N and Boswell R 2009 J. Phys. D: Appl. Phys. 42 142003
12. Soloshenko I A, Tsiolko V V, Pogulay S S, Kalyuzhnaya A G, Bazhenov Yu V and Shchedrin A I 2009 Plasma Sources Sci. Technol. 18 045019
13. Bruggeman P, Iza F, Lauwers D and Aranda Gonzalvo Y 2010 J. Phys. D: Appl. Phys. 43 012003
14. Bruggeman P et al 2010 J. Phys. D: Appl. Phys. 43 124005
15. Kong M G et al 2009 Plasma medicine: an introductory review New J. Phys. 11 115012
16. Bruggeman P and Leys C 2009 J. Phys. D: Appl. Phys. 42 053001
17. Bhoj A N and Kushner M J 2008 Plasma Sources Sci. Technol. 17 035024
18. Kogelschatz U 2004 Plasma Phys. Control. Fusion 46 B63-B75
19. Malik M A 2010 Plasma Chem. Plasma Process. 30 21-31
20. Grabowski L R, van Veldhuizen E M, Pemen A J M and Rutgers W R 2006 Plasma Chem. Plasma Process. 26 3-17
21. Burlica R, Kirkpatrick M J and Locke B R 2006 J. Electrostat. 64 35-43
22. Artamonova E et al 2008 J. Phys. D: Appl. Phys. 41 155206
23. Daily J W 1997 Prog. Energy Combust. Sci. 23 133-99
24. NIST Chemical Kinetics Database, Standard Reference Database 17, Version 7.0 (Web Version), Release 1.4.2, Data Version 2009.01 (http://kinetics.nist.gov/kinetics/)
25. Itikawa Y and Mason N 2005 J. Phys. Chem. Ref. Data 34 1-22
26. Jensen M J et al 1999 Phys. Rev. A 60 2970-6
27. Miller T J, Farquhar P R A and Willacy K 1997 Astron. Astrophys. Suppl. Ser. 121 139
28. Gordillo-Vazquez F J 2008 J. Phys. D: Appl. Phys. 41 234016
29. Kushner M J 1999 Bull. Am. Phys. Soc. 44 63
30. Herron J T and Green D S 2001 Plasma Chem. Plasma Process. 21 459-81
31. Baulch D L et al 1994 Combust. Flame 98 59-79
32. Novick S and Krenos J 1988 J. Chem. Phys. 89 7031
33. Fridman A 2008 Plasma Chemistry (Cambridge: Cambridge University Press)
34. Ikezoe Y, Matsuoka S, Takebe M and Viggiano A 2007 Gas Phase Ion-Molecule Reaction Rate Constants Through 1986 (Ion Reaction Research Group Society of Japan)
35. Ricard A, Decomps Ph and Massines F 1999 Surface Coat. Technol. 112 1-4
36. Gabriel O, Schram D C and Engeln R 2008 Phys. Rev. E 78 016407
37. Bruggeman P, Schram D C, Gonzalez M A, Rego R, Kong M G and Leys C 2009 Plasma Sources Sci. Technol. 18 025017
38. Ono R and Oda T 2008 J. Phys. D: Appl. Phys. 41 035204
39. Buuron A J M, Otorbaev D K, van der Sanden M C M and Schram D C 1994 Phys. Rev. E 50 1383
40. Meulenbroeks R F G, Steenbakkers M F M, Qing Z, van der Sanden M C M and Schram D C 1994 Phys. Rev. E 49 2272
41. Burlica R and Locke B R 2008 IEEE Trans. Ind. Appl. 44 482-89
42. Bruggeman P, Schram D C, Kong M G and Leys C 2009 Plasma Process. Polym. 6 751-62
43. Bruggeman P et al 2010 Plasma Sources Sci. Technol. 19 015016
44. Benstaali B, Boubert P, Cheron B G, Addou A and Brisset J L 2002 Plasma Chem. Plasma Proc. 22 553-71
45. Ono R and Oda T 2001 IEEE Trans. Ind. Appl. 37 709-14
46. Srivastava N, Wang C and Dibble T S 2009 Eur. Phys. J. D 54 77-86
47. Ono R and Oda T 2003 J. Appl. Phys. 93 5876-82
48. Hibert C, Gaurand I, Mortret O and Pouvesle J M 1999 J. Appl. Phys. 85 7070-5
49. Liu Z W, Yang X F, Zhu A M, Zhao G L and Xu Y 2008 Eur. Phys. J. D 48 365-73 [49] Verreycken T and Bruggeman P, unpublished results
50. Bruggeman P, Liu J, Degroote J, Kong M G, Vierendeels J and Leys C 2008 J. Phys. D: Appl. Phys. 41 215201
51. Bruggeman P, Ribezl E, Maslani A, Degroote J, Malesevic A, Rego R, Vierendeels J and Leys C 2008 Plasma Sources Sci. Technol. 17 025012
52. Wang C, Srivastava N and Dibble T S 2010 Appl. Phys. Lett. 95 051501
53. Wang C, Srivastava N, Scherrer S, Jang P R, Dibble T S and Duan Y 2009 Plasma Sources Sci. Technol. 18 02030
54. An W, Baumung K and Bluhm H 2007 J. Appl. Phys. 101 053302