Quantized conductive filament formed by limited Cu source in sub-5nm era

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2011, Pages

  Park, J ^a   Lee, W ^a   Choe, M ^a   Jung, S ^a   Son, M ^a   Kim, S ^a   Park, S ^a   Shin, J ^a   Lee, D ^a   Siddik, M ^a   Woo, J ^a   Choi, G ^a   Cha, E ^a   Lee, T ^a   Hwang, H ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTANCE STATE; CONDUCTIVE FILAMENTS; CONDUCTIVE PATHS; CU IONS; ELECTRODE RADII; FABRICATION TECHNOLOGIES; MEMORY APPLICATIONS; MULTI-BITS; RESISTIVE SWITCHING; X-POINT;

ELECTRON DEVICES;

HEAVY IONS;

EID: 84863052126     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2011.6131484     Document Type: Conference Paper

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