Growth of high-aspect ratio horizontally-aligned ZnO nanowire arrays

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 8, 2011, Pages 6880-6885

  Soman, Pranav ^a   Darnell, Max ^a   Feldman, Marc D ^b   Chen, Shaochen ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS HEALTH SCIENCE CENTER AT SAN ANTONIO   (United States)

Author keywords

E beam lithography; High Aspect ratio; Horizontally aligned; Nanowire; Patterning; PDMS; Zinc oxide

Indexed keywords

E-BEAM LITHOGRAPHY; HIGH-ASPECT RATIO; HORIZONTALLY-ALIGNED; PATTERNING; PDMS;

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; MICROCHANNELS; NANOTECHNOLOGY; NANOWIRES;

ZINC OXIDE;

EID: 84863011274     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.4210     Document Type: Conference Paper

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