SCOPUS 정보 검색 플랫폼

Volumn 99, Issue 26, 2011, Pages

High temperature thermal properties of thin tantalum nitride films

(8) Bozorg Grayeli, Elah a Li, Zijian a Asheghi, Mehdi a Delgado, Gil b Pokrovsky, Alexander b Panzer, Matthew b Wack, Daniel b Goodson, Kenneth E a

a Stanford University (United States)

b KLA TENCOR CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY RESISTANCE; CONDUCTIVITY MEASUREMENTS; EXTREME ULTRAVIOLET MASKS; HIGH HEAT FLUX; HIGH TEMPERATURE; IN-PLANE; MEAN FREE PATH; PICOSECOND THERMOREFLECTANCE; RELATIVE IMPORTANCE; TANTALUM NITRIDES; TANTALUM-NITRIDE FILM; THERMAL BOUNDARY RESISTANCE; THERMAL CONDUCTION; THERMAL TRANSPORT;

HIGH TEMPERATURE APPLICATIONS; MRAM DEVICES; NITRIDES; RANDOM ACCESS STORAGE; TANTALUM; TANTALUM COMPOUNDS; THERMODYNAMIC PROPERTIES;

THERMAL CONDUCTIVITY;

EID: 84862972514 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3672098 Document Type: Article

Times cited : (40)

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