Chiral nematic fluids as masks for lithography

Advanced Materials

Volumn 24, Issue 3, 2012, Pages 381-384

  Jeong, Hyeon Su ^a   Kim, Yun Ho ^b   Lee, Ji Sun ^a   Kim, Jung Hyun ^a   Srinivasarao, Mohan ^c   Jung, Hee Tae ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Research Institute of Chemical Technology   (South Korea)

^c Georgia Institute of Technology   (United States)

Author keywords

cholesteric liquid crystals; lithography; photomasks; self assembly

Indexed keywords

CHIRAL NEMATICS; CYLINDRICAL LENS; HELICAL AXIS; LIGHT BEAM; PARALLEL LINE;

CRYSTALS; ELECTRIC FIELDS; LIQUIDS; LITHOGRAPHY; PHOTOMASKS; PHOTORESISTS;

CHOLESTERIC LIQUID CRYSTALS;

EID: 84862934298     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201103817     Document Type: Article

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