From covalent bonding to coalescence of metallic nanorods

Nanoscale Research Letters

Volumn 6, Issue , 2011, Pages 1-6

  Lee, Soohwan ^a   Huang, Hanchen ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

Adatom; Covalent bonding; Diffusion; Metal surface steps; Simulation

Indexed keywords

AB INITIO CALCULATIONS; CHARACTERISTIC LENGTH; COVALENT BONDING; DENSITY FUNCTIONALS; ES BARRIER; METAL SURFACE STEPS; METALLIC NANORODS; NANOROD GROWTH; NEW MECHANISMS; SIMULATION;

ADATOMS; ALUMINUM; CALCULATIONS; COALESCENCE; DENSITY FUNCTIONAL THEORY; DIFFUSION; NANORODS; PHYSICAL VAPOR DEPOSITION; SURFACE ACTIVE AGENTS; THREE DIMENSIONAL;

FILM GROWTH;

EID: 84862917075     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-559     Document Type: Article

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