Adatom Ascending at Step Edges and Faceting on fcc Metal (110) Surfaces

Physical Review Letters

Volumn 92, Issue 10, 2004, Pages

  Zhu, Wenguang ^a,b   De Mongeot, Francesco Buatier ^c   Valbusa, U ^c   Wang, E G ^a   Zhang, Zhenyu ^b,d  

^a INSTITUTE OF PHYSICS   (China)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c INFM   (Italy)

^d UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BOUNDARY CONDITIONS; COMPUTER SIMULATION; DIFFUSION; EPITAXIAL GROWTH; GROWTH KINETICS; MATHEMATICAL MODELS; MONTE CARLO METHODS; MORPHOLOGY; OPTIMIZATION; PROBABILITY DENSITY FUNCTION; QUANTUM THEORY; THERMODYNAMICS;

BRILLOUIN ZONES; DENSITY FUNCTIONAL THEORY (DFT); ELECTRONIC RELAXATIONS; PROTOTYPICAL MODEL;

CRYSTALLOGRAPHY;

EID: 2142768844     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.92.106102     Document Type: Article

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