메뉴 건너뛰기




Volumn 2, Issue 2, 2010, Pages 335-338

Ultrathin W-Al dual interlayer approach to depositing smooth and adherent nanocrystalline diamond films on stainless steel

Author keywords

Adhesion; Chemical vapor deposition; Diamond thin film; Interlayer; Steel

Indexed keywords

CARBON DIFFUSION; DENSE STRUCTURES; DIAMOND NUCLEATION; DIAMOND THIN FILM; HIGH PURITY; INNER LAYER; INTERLAYER; INTERMEDIATE LAYERS; METAL INTERLAYERS; MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; NANO SCALE; NANOCRYSTALLINE DIAMOND FILMS; SMOOTH SURFACE; STEEL SURFACE; ULTRA-THIN;

EID: 84862832828     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am9007159     Document Type: Article
Times cited : (34)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.