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Volumn 2, Issue 2, 2010, Pages 335-338
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Ultrathin W-Al dual interlayer approach to depositing smooth and adherent nanocrystalline diamond films on stainless steel
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Author keywords
Adhesion; Chemical vapor deposition; Diamond thin film; Interlayer; Steel
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Indexed keywords
CARBON DIFFUSION;
DENSE STRUCTURES;
DIAMOND NUCLEATION;
DIAMOND THIN FILM;
HIGH PURITY;
INNER LAYER;
INTERLAYER;
INTERMEDIATE LAYERS;
METAL INTERLAYERS;
MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION;
NANO SCALE;
NANOCRYSTALLINE DIAMOND FILMS;
SMOOTH SURFACE;
STEEL SURFACE;
ULTRA-THIN;
ADHESION;
ALUMINUM;
CARBIDES;
DEPOSITION;
DIAMONDS;
PLASMA DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
STAINLESS STEEL;
STEEL CORROSION;
SYNTHETIC DIAMONDS;
TUNGSTEN;
ULTRATHIN FILMS;
VAPOR DEPOSITION;
DIAMOND FILMS;
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EID: 84862832828
PISSN: 19448244
EISSN: 19448252
Source Type: Journal
DOI: 10.1021/am9007159 Document Type: Article |
Times cited : (34)
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References (24)
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