메뉴 건너뛰기




Volumn 33, Issue 4, 2012, Pages 543-545

A two-mask process for fabrication of bottom-gate IGZO-based TFTs

Author keywords

Gray tone mask (GTM); transparent oxide thin film transistor (TFT); two mask process

Indexed keywords

ACTIVE CHANNELS; CURRENT RATIOS; FIELD-EFFECT MOBILITIES; GRAY-TONE MASK (GTM); PIXEL ELECTRODES; SOURCE-DRAIN ELECTRODES; SUBTHRESHOLD SWING; THIN FILM TRANSISTORS (TFT); TWO-MASK PROCESS;

EID: 84862788738     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2012.2182986     Document Type: Article
Times cited : (15)

References (8)
  • 2
    • 44249123058 scopus 로고    scopus 로고
    • Amorphous IZObased transparent thin film transistors
    • Jul.
    • D. Paine, B. Yaglioglu, Z. Beiley, and S. H. Lee, " Amorphous IZObased transparent thin film transistors, " Thin Solid Films, vol. 516, no. 17, pp. 5894-5898, Jul. 2008.
    • (2008) Thin Solid Films , vol.516 , Issue.17 , pp. 5894-5898
    • Paine, D.1    Yaglioglu, B.2    Beiley, Z.3    Lee, S.H.4
  • 3
    • 38649107109 scopus 로고    scopus 로고
    • Amorphous oxide channel TFTs
    • Feb.
    • H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono, " Amorphous oxide channel TFTs, " Thin Solid Films, vol. 516, no. 7, pp. 1516-1522, Feb. 2008.
    • (2008) Thin Solid Films , vol.516 , Issue.7 , pp. 1516-1522
    • Kumomi, H.1    Nomura, K.2    Kamiya, T.3    Hosono, H.4
  • 4
    • 49749097843 scopus 로고    scopus 로고
    • TFT-LCD manufacturing technology-Current status and future prospect
    • Dec.
    • Y. Ukai, " TFT-LCD manufacturing technology-Current status and future prospect, " in Proc. Int. Workshop Phys. Semicond. Devices, Dec. 2007, pp. 29-34.
    • (2007) Proc. Int. Workshop Phys. Semicond. Devices , pp. 29-34
    • Ukai, Y.1
  • 7
    • 0038137808 scopus 로고    scopus 로고
    • A novel four-mask-count process architecture for TFT-LCDs
    • May
    • C. W. Kim, Y. B. Park, H. S. Kong, D. G. Kim, S. J. Kang, J. W. Jang, and S. S. Kim, " A novel four-mask-count process architecture for TFT-LCDs, " SID Symp. Dig., vol. 31, no. 1, pp. 1006-1009, May 2000.
    • (2000) SID Symp. Dig. , vol.31 , Issue.1 , pp. 1006-1009
    • Kim, C.W.1    Park, Y.B.2    Kong, H.S.3    Kim, D.G.4    Kang, S.J.5    Jang, J.W.6    Kim, S.S.7
  • 8
    • 72149127642 scopus 로고    scopus 로고
    • ITO lift-off technique for TFT mask-reduction process
    • Jun.
    • K. L. Fang, H. T. Lin, and C. H. Chen, " ITO lift-off technique for TFT mask-reduction process, " J. Soc. Inf. Display, vol. 17, no. 6, pp. 519-523, Jun. 2009.
    • (2009) J. Soc. Inf. Display , vol.17 , Issue.6 , pp. 519-523
    • Fang, K.L.1    Lin, H.T.2    Chen, C.H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.