Low-temperature ozone exposure technique to modulate the stoichiometry of WO x nanorods and optimize the electrochromic performance

Nanotechnology

Volumn 23, Issue 25, 2012, Pages

  Lin, Feng ^a,b   Li, Chi Ping ^b   Chen, Gang ^b   Tenent, Robert C ^a   Wolden, Colin A ^b   Gillaspie, Dane T ^a   Dillon, Anne C ^a   Richards, Ryan M ^b   Engtrakul, Chaiwat ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b Department of Metallurgical and Materials Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; COLORATION EFFICIENCIES; ELECTROCHROMIC FILMS; ELECTROCHROMIC PERFORMANCE; FLEXIBLE POLYMER SUBSTRATES; HIGH TEMPERATURE; HOT WIRE CHEMICAL VAPOR DEPOSITION; LOW TEMPERATURES; OZONE EXPOSURES; PARTICLE GROWTH; POST TREATMENT; PROPYLENE CARBONATE ELECTROLYTE; SURFACE CRYSTALLINITY; SWITCHING SPEED; THERMAL-ANNEALING; TRANSMISSION ELECTRON MICROSCOPY TEM; ULTRASONIC SPRAY DEPOSITION; UVVISNIR;

CHEMICAL VAPOR DEPOSITION; ELECTROCHROMISM; NANORODS; PHOTOELECTRONS; RAMAN SPECTROSCOPY; STOICHIOMETRY; TEMPERATURE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRASONIC TESTING; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

OZONE;

EID: 84861851200     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/25/255601     Document Type: Article

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