Structure and composition of sputter-deposited nickel-tungsten oxide films

Thin Solid Films

Volumn 519, Issue 7, 2011, Pages 2062-2066

  Green, S V ^a   Kuzmin, A ^b   Purans, J ^b   Granqvist, C G ^a   Niklasson, G A ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b UNIVERSITY OF LATVIA   (Latvia)

Author keywords

Nickel oxide; Raman spectroscopy; Rutherford backscattering; Tungsten oxide; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

DC MAGNETRON CO-SPUTTERING; METALLIC TARGETS; NANO-SIZED; NICKEL-TUNGSTEN; RUTHERFORD BACK-SCATTERING; RUTHERFORD BACK-SCATTERING SPECTROMETRY; TUNGSTEN OXIDE; X RAY DIFFRACTOMETRY;

AMORPHOUS FILMS; BACKSCATTERING; DIFFRACTION; ELECTRONS; MAGNETRONS; METALLIC COMPOUNDS; NICKEL; NICKEL OXIDE; PHOTOELECTRICITY; PHOTONS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; TUNGSTEN; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

OXIDE FILMS;

EID: 78751642394     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.10.033     Document Type: Article

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