Relaxor behaviour of K 0.5Bi 0.5NbO 3- BiScO 3 ceramics

Applied Physics Letters

Volumn 100, Issue 20, 2012, Pages

  Kruea In, Chatchai ^a   Rujijanagul, Gobwute ^b   Zhu, Fang Yuan ^c   Milne, Steven J ^c  

^a CHIANG MAI RAJABHAT UNIVERSITY   (Thailand)

^b CHIANG MAI UNIVERSITY   (Thailand)

^c UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PERMITTIVITIES; FREQUENCY-DEPENDENT; HIGH TEMPERATURE; HIGHER TEMPERATURES; LEAD-FREE; RELATIVE PERMITTIVITY; RELAXOR BEHAVIOUR; RELAXORS; TIO; VOGEL-FULCHER;

NIOBIUM OXIDE; PERMITTIVITY;

CERAMIC MATERIALS;

EID: 84861813860     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4718422     Document Type: Article

References (27)

1. R. E. Eitel, C. A. Randall, T. R. Shrout, and S. E. Park, Jpn. J. Appl. Phys., Part 1 41, 2099 (2002). 10.1143/JJAP.41.2099
2. G. A. Smolenski, V. A. Isupov, A. I. Agranovskaya, and S. N. Popov, Sov. Phys. Solid State 2, 2584 (1961).
3. S. S. N. Bharadwaja, J. R. Kim, H. Ogihara, L. E. Cross, S. Trollier McKinstry, and C. A. Randall, Phys. Rev. B 83, 024106 (2011). 10.1103/PhysRevB.83.024106
4. V. Bovtun, S. Veljko, S. Kamba, J. Petzelt, S. Vakhrushev, Y. Yakymenko, K. Brinkman, and N. Setter, J. Eur. Ceram. Soc. 26, 2867 (2006). 10.1016/j.jeurceramsoc.2006.02.003
5. Z. Kutnjak, C. Filipic, R. Pirc, A. Levstik, R. Farhi, and M. El Marssi, Phys. Rev. B. 59, 294 (1999). 10.1103/PhysRevB.59.294
6. B. Dkhil, P. Gemeiner, A. Al-Barakaty, L. Bellaiche, E. Dulkin, E. Mojaev, and M. Roth, Phys. Rev. B 80, 064103 (2009). 10.1103/PhysRevB.80.064103
7. D. Viehland, S. J. Jang, L. E. Cross, and M. Wuttig, Phys. Rev. B 46, 8003 (1992). 10.1103/PhysRevB.46.8003
8. C. A. Randall and A. S. Bhalla, Jpn. J. Appl. Phys., Part 1 29, 327 (1990). 10.1143/JJAP.29.327
9. T. Maiti, R. Guo, and A. S. Bhalla, J. Appl. Phys. 100, 114109 (2006). 10.1063/1.2392996
10. H. Y. Guo, C. Lei, and Z.-G. Ye, Appl. Phys. Lett. 92, 172901 (2008). 10.1063/1.2913208
11. H. Ogihara, C. A. Randall, and S. Trolier-McKimstry, J. Am. Ceram. Soc. 92, 110 (2009). 10.1111/j.1551-2916.2008.02798.x
12. V. Bobnar, J. Bernard, and M. Kosec, Appl. Phys. Lett. 85, 994 (2004). 10.1063/1.1779947
13. C. J. B. Lim, S. Zhang, and T. R. Shrout, Electron. Mater. Lett. 7, 71 (2011). 10.1007/s13391-011-0311-8
14. H. Matsuo, Y. Noguchi, M. Miyayama, M. Suzuki, A. Watanabe, S. Sassabe, T. Ozaki, S. Mori, S. Torii, and T. Kamiyama, J. Appl. Phys. 108, 104103 (2010). 10.1063/1.3506717
15. Z. F. Li, C. L. Wang, W. L. Zhong, J. C. Li, and M. L. Zhao, J. Appl. Phys. 94, 2548 (2003). 10.1063/1.1592290
16. A. A. Belik, S. Iikubo, K. Kodama, N. Igawa, S. Shamoto, M. Maie, T. Nagai, Y. Matsui, S. Stefanovich, I. Bogdan, I. Lazoryak, and E. Takayama-Muromachi, J. Am. Chem. Soc. 128, 706 (2006). 10.1021/ja057574u
17. R. E. Eitel, C. A. Randall, T. R. Shrout, P. W. Rehrig, W. Hackenberger, and S. E. Park, Jpn. J. Appl. Phys., Part 1 40, 5999 (2001). 10.1143/JJAP.40.5999
18. C. J. Stringer, T. R. Shrout, and C. A. Randall, J. Appl. Phys. 101, 054107 (2007). 10.1063/1.2537753
19. R. Pirc and B. Blinc, Phys. Rev. B 76, 020101 (2007). 10.1103/PhysRevB.76.020101
20. A. Tagantsev, Phys. Rev. Lett. 72, 1100 (1994). 10.1103/PhysRevLett.72. 1100
21. A. Levstik, Z. Kutnak, C. Filipic, and R. Pirc, Phys. Rev. B 57, 11204 (1998). 10.1103/PhysRevB.57.11204
22. C. Elissalde and J. Ravez, J. Mater. Chem. 11, 1957 (2001). 10.1039/b010117f
23. N. Raengthon and D. P. Cann, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 58, 1954 (2011). 10.1109/TUFFC.2011.2036
24. C. C. Huang, D. Cann, X. Tan, and N. Vittayakorn, J. Appl. Phys. 102, 044103 (2007). 10.1063/1.2769787
25. R. Dittmer, W. Jo, D. Damjanovic, and J. Rodel, J. Appl. Phys. 109, 034107 (2011). 10.1063/1.3544481
26. International Centre for Diffraction Data File Nos. (a) 012-0213; (b) 041-0167; (c) 043-0200.
27. J. Yang, Y. Hou, C. Wang, M. Zhu, and H. Yan, Appl. Phys. Lett. 91, 023118 (2007). 10.1063/1.2754366