EUV mask line edge roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8322, Issue , 2012, Pages

  Zweber, Amy E ^a   Gallagher, Emily ^a   Sanchez, Martha ^b   Senna, Tasuku ^c   Negishi, Yoshiyuki ^c   Konishi, Toshio ^c   McGuire, Anne ^a   Bozano, Luisa ^b   Brock, Phil ^b   Truong, Hoa ^b  

^a IBM   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c Toppan Photomasks Inc   (United States)

Author keywords

EUV; Line edge roughness; Line width roughness; Photomask; Resist

Indexed keywords

ANALYSIS TECHNIQUES; EUV; EUV MASK; EXTREME ULTRAVIOLET MASKS; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; MASK ABSORBER; MULTIPLE IMAGING; RESIST; ROADMAP;

PHOTOMASKS;

ROUGHNESS MEASUREMENT;

EID: 84861521337     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916291     Document Type: Conference Paper

References (10)

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