A new inorganic EUV resist with high-etch resistance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8322, Issue , 2012, Pages

  Trikeriotis, Markos ^a   Krysak, Marie ^a   Chung, Yeon Sook ^a   Ouyang, Christine ^a   Cardineau, Brian ^b   Brainard, Robert ^b   Ober, Christopher K ^a   Giannelis, Emmanuel P ^a   Cho, Kyoungyong ^c  

^a School of Operations Research and Industrial Engineering   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c SEMATECH   (United States)

Author keywords

Etch resistance; EUV lithography; Hafnium oxide; Inorganic photoresist; Nanoparticles; Zirconium oxide

Indexed keywords

ABSORBANCES; E-BEAM LITHOGRAPHY; ETCH RESISTANCE; EUV RESISTS; HIGH SENSITIVITY; HIGH-RESOLUTION PATTERNING; INORGANIC PHOTORESISTS; INORGANIC RESIST; PATTERN COLLAPSE; PATTERN TRANSFERS; PERFORMANCE REQUIREMENTS; POLYMER RESIST; RESOLUTION LIMITS; VERY THIN FILMS;

EXTREME ULTRAVIOLET LITHOGRAPHY; HAFNIUM OXIDES; LITHOGRAPHY; NANOPARTICLES; OXIDES; ZIRCONIA;

PHOTORESISTS;

EID: 84861506485     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916384     Document Type: Conference Paper

References (5)

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3. Henke, B. L., Gullikson, E. M. and. Davis, J. C., "X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30000 eV, Z=1-92", Atomic Data and Nuclear Data Tables 54(2), 181-342 (1993).
4. Trikeriotis, M., Bae, W. J., Schwartz, E., Krysak, M., Lafferty, N., Xie, P., Smith, B., Zimmerman, P. A., Ober, C. K. and Giannelis, E. P., "Development of an inorganic photoresist for DUV, EUV, and electron beam imaging," Proc. SPIE 7639, 76390E/1-76390E/10 (2010).
5. Krysak, M., Trikeriotis, M., Schwartz, E., Lafferty, N., Xie, P., Smith, B., Zimmerman, P. A., Montgomery, W., Giannelis, E. P. and Ober, C. K., "Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography", Proc. SPIE 7972, 79721C (2011).