Evaluation of microwave plasma oxidation treatments for the fabrication of photoactive un-doped and carbon-doped TiO 2 coatings

Surface and Coatings Technology

Volumn 206, Issue 19-20, 2012, Pages 4113-4118

  Dang, Binh H Q ^a   Rahman, Mahfujur ^a   MacElroy, Don ^a   Dowling, Denis P ^a  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

Carbon doping; Microwave plasma; Sputtering; Titanium oxidation; Water splitting

Indexed keywords

CARBON DOPING; CARBON-DOPED TITANIUM DIOXIDE; FEG-SEM; MICROWAVE PLASMA; MICROWAVE PLASMA OXIDATION; OPTICAL PROFILOMETRY; OXIDATION TIME; OXIDATION TREATMENTS; OXIDE LAYER; PHOTOACTIVITY; PHOTOCURRENT DENSITY; REACTIVE MAGNETRON SPUTTERING; TIO; TITANIUM CARBIDE THIN FILMS; TITANIUM METALS; TITANIUM OXIDATIONS; WATER SPLITTING; XRD;

CARBON; DENSITY MEASUREMENT (SPECIFIC GRAVITY); FABRICATION; MAGNETRONS; MICROWAVES; OXIDATION; SPUTTERING; SURFACE ROUGHNESS; TITANIUM; TITANIUM CARBIDE; TITANIUM DIOXIDE;

COATINGS;

EID: 84861456742     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.04.003     Document Type: Article

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