High pressure diamond and diamond-like carbon deposition using a microwave CAP reactor

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 1036-1040

  McConnell, M L ^a   Dowling, D P ^a   Pope, C ^a   Donnelly, K ^a   Ryder, A G ^b   O'Connor, G M ^b  

^a Surface Engineering Group   (Ireland)

^b NATIONAL UNIVERSITY OF IRELAND   (Ireland)

Author keywords

Diamond; Diamond like carbon; Microwave; Plasma

Indexed keywords

COATINGS; DEPOSITION; ELECTRON MICROSCOPY; RAMAN SPECTROSCOPY; SILICON WAFERS;

ANNULAR REGIONS;

DIAMOND LIKE CARBON FILMS;

COATING; DIAMOND-LIKE CARBON; FILM; FRICTION; INDUSTRIAL APPLICATION; MECHANICAL PROPERTY;

EID: 0036508217     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00637-9     Document Type: Article

References (14)