Site-selective assembly of quantum dots on patterned self-assembled monolayers fabricated by laser direct-writing

Nanotechnology

Volumn 23, Issue 23, 2012, Pages

  Wu, Chong ^a   Wang, Yongsheng ^a,b   Han, Xuemingyue ^a   Hu, Xinming ^a   Cheng, Qianyi ^a   Han, Baohang ^a   Liu, Qian ^a   Ren, Tianling ^b   He, Yonghong ^b   Sun, Shuqing ^b   Ma, Hui ^b  

^a NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

^b TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FEATURE SIZES; FRICTION FORCE MICROSCOPY; IRRADIATION DOSE; LASER DIRECT-WRITING; LASER-INDUCED ABLATION; MASKLESS FABRICATION; NATIVE OXIDE LAYER; OCTADECYLPHOSPHONIC ACIDS; SAM MOLECULES; SAMS; SITE SELECTIVE; TERMINAL GROUPS; TITANIUM FILM;

ADSORPTION; ATOMIC FORCE MICROSCOPY; SEMICONDUCTOR QUANTUM DOTS; TITANIUM; TITANIUM OXIDES;

SELF ASSEMBLED MONOLAYERS;

QUANTUM DOT;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; LASER; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; MOLECULAR IMPRINTING; RADIATION EXPOSURE; SURFACE PROPERTY;

CRYSTALLIZATION; LASERS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; MOLECULAR IMPRINTING; QUANTUM DOTS; SURFACE PROPERTIES;

EID: 84861310007     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/23/235302     Document Type: Article

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