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Materials Science and Engineering: B

Volumn 177, Issue 10, 2012, Pages 750-755

Characterization of Si nanowaveguide line edge roughness and its effect on light transmission

(6) Fursenko, O a Bauer, J a Knopf, A a Marschmeyer, S a Zimmermann, L a Winzer, G b

a IHP (Germany)

b TECHNISCHE UNIVERSITÄT BERLIN (Germany)

Author keywords

AFM; Line edge roughness; Nanowaveguide; Optical loss; SEM

Indexed keywords

ATOMIC FORCE MICROSCOPY; LIGHT TRANSMISSION; OPTICAL CORRELATION; ROUGHNESS MEASUREMENT; SILICON ON INSULATOR TECHNOLOGY; SILICON PHOTONICS;

ATOMIC FORCE; ATOMIC FORCE MICROSCOPE; LINE EDGE ROUGHNESS; LOW-LOSS; NANOWAVEGUIDES; PHOTONIC WIRES; PROCESS TECHNOLOGIES; SCATTERING LOSS; SILICON ON INSULATOR; TELECOMMUNICATION WAVELENGTHS;

SCANNING ELECTRON MICROSCOPY;

EID: 84861233181 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2011.12.048 Document Type: Article

Times cited : (8)

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