Electrodeposition of protective organosilane films from a thin layer of precursor solution

Corrosion Science

Volumn 60, Issue , 2012, Pages 309-313

  Jiang, Liang Liang ^a   Wu, Lian Kui ^a   Hu, Ji Ming ^a   Zhang, Jian Qing ^a,b   Cao, Chu Nan ^a,b  

^a ZHEJIANG UNIVERSITY   (China)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

A. Aluminium; B. EIS; C. Electrodeposited films; C. Neutral inhibition

Indexed keywords

2024-T3; B. EIS; BULK SOLUTIONS; CORROSION PERFORMANCE; DEPOSITION CURRENT; ELECTRODEPOSITED FILMS; FILM FORMATIONS; GENERATION RATE; ORGANOSILANES; OXYGEN DIFFUSION; PRECURSOR SOLUTIONS; SILANE FILMS; THIN ELECTROLYTE LAYER; THIN LAYERS;

ELECTROLYTES; SILANES;

ELECTRODEPOSITION;

EID: 84861203280     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2012.03.042     Document Type: Article

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