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Volumn 44, Issue 6, 2012, Pages 963-966

Scattering by flexural phonons in suspended graphene under back gate induced strain

Author keywords

Graphene; Phonons; Resistivity; Strain

Indexed keywords

BACK GATES; INDUCED STRAIN; OUT-OF-PLANE; PHONON MODE; QUADRATIC DISPERSION; ROTATIONAL SYMMETRIES;

EID: 84861186804     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2011.03.017     Document Type: Article
Times cited : (50)

References (20)
  • 17
    • 84861199137 scopus 로고    scopus 로고
    • Derivation details will be given elsewhere
    • Derivation details will be given elsewhere.
  • 20
    • 84861188381 scopus 로고    scopus 로고
    • We used g=3 eV, β = 3, ΔL = 0, and L = 0.3 μm. The latter parameter is interpreted as an effective length mimicking the difference between our two side clamped membrane and the real four point clamped device
    • We used g=3 eV, β = 3, ΔL = 0, and L = 0.3 μm. The latter parameter is interpreted as an effective length mimicking the difference between our two side clamped membrane and the real four point clamped device.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.