SIMS investigation of MoS 2 based sputtercoatings

Applied Surface Science

Volumn 179, Issue 1-4, 2001, Pages 269-274

  Heinisch, C ^a   Piplits, K ^a   Kubel, F ^a   Schintlmeister, A ^b   Pfluger E ^c   Hutter, H ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b PLANSEE SE   (Austria)

^c CSEM   (Switzerland)

Author keywords

MoS 2; SIMS; TiAlN

Indexed keywords

ALUMINUM NITRIDE; AMORPHOUS FILMS; COATINGS; CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; MOLYBDENUM COMPOUNDS; SECONDARY ION MASS SPECTROMETRY; STOICHIOMETRY; THIN FILMS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

DEPTH PROFILING; ELECTRON PROBE MICROANALYSIS; MOLYBDENUM DISULFIDE; TITANIUM ALUMINUM NITRIDE;

LUBRICATION;

EID: 0035898743     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00294-X     Document Type: Article

References (11)