Electrodeposition of hierarchical Ag nanostructures on ITO glass for reproducible and sensitive SERS application

Applied Surface Science

Volumn 258, Issue 17, 2012, Pages 6632-6636

  Bian, Jun Cao ^a   Chen, Zhong Dong ^a   Li, Zhe ^a   Yang, Fei ^a   He, Hai Yan ^a   Wang, Juan ^a   Tan, Jeannie Ziang Yie ^a   Zeng, Jie Liang ^a   Peng, Rui Qun ^a   Zhang, Xi Wen ^a   Han, Gao Rong ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Electrodeposition; Hierarchical Ag nanostructures; Reproducibility; Sensitivity; SERS

Indexed keywords

ELECTRODEPOSITION; ELECTRODES; NANOSTRUCTURES; SILVER;

COMPLEXING AGENTS; PRECURSOR CONCENTRATION; REPRODUCIBILITIES; RHODAMINE 6G; SENSITIVITY; SERS;

ITO GLASS;

EID: 84860231085     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.03.093     Document Type: Article

References (34)

1. S. Nie, and S.R. Emory Science 275 1997 1102
2. Y. Fang, N. Seong, and D.D. Dlott Science 321 2008 388
3. D. Lim, K. Jeon, H.M. Kim, J. Nam, and Y.D. Suh Nat. Mater. 9 2010 60
4. K. Kneipp, H. Kneipp, and J. Kneipp Acc. Chem. Res. 39 2006 443
5. T. Dadosh Mater. Lett. 63 2009 2236
6. Y. Sun, and Y. Xia Science 298 2002 2176
7. K.E. Korte, S.E. Skrabalak, and Y. Xia J. Mater. Chem. 18 2008 437
8. J. Song, Y. Chu, Y. Liu, L. Li, and W. Sun Chem. Commun. 2008 1223
9. Y. Wang, P.H.C. Camargo, S.E. Skrabalak, H. Gu, and Y. Xia Langmuir 24 2008 12042
10. L. Fan, and R. Guo Cryst. Growth Des. 8 2008 2150
11. X. Li, J. Wang, Y. Zhang, M. Li, and J. Liu Eur. J. Inorg. Chem. 2010 1806
12. B.K. Jena, B.K. Mishra, and S. Bohidar J. Phys. Chem. C 113 2009 14753
13. L. Lu, A. Kobayashi, K. Tawa, and Y. Ozaki Chem. Mater. 18 2006 4894
14. M. Zhang, A. Zhao, H. Guo, D. Wang, Z. Gan, H. Sun, D. Li, and M. Li CrystEngComm 13 2011 5709
15. Y. Han, S. Liu, M. Han, J. Bao, and Z. Dai Cryst. Growth Des. 9 2009 3941
16. C.E. Talley, J.B. Jackson, C. Oubre, N.K. Grady, C.W. Hollars, S.M. Lane, T.R. Huser, P. Nordlander, and N.J. Halas Nano Lett. 5 2005 1569
17. J. Fang, H. You, P. Kong, Y. Yi, X. Song, and B. Ding Cryst. Growth Des. 7 2007 864
18. A. Gutes, C. Carraro, and R. Maboudian J. Am. Chem. Soc. 132 2010 1476
19. P.R. Brejna, U. Sahaym, M.G. Norton, and P.R. Griffiths J. Phys. Chem. C 115 2011 1444
20. S. Tanga, X. Meng, C. Wang, and Z. Cao Mater. Chem. Phys. 114 2009 842
21. Q. Zhou, S. Wang, N. Jia, L. Liu, J. Yang, and Z. Jiang Mater. Lett. 60 2006 3789
22. C. Gu, and T. Zhang Langmuir 24 2008 12010
23. B. Rezaei, and S. Damiri Talanta 83 2010 197
24. S. Cherevko, X. Xing, and C. Chung Electrochem. Commun. 12 2010 467
25. X. Qin, H. Wang, X. Wang, Z. Miao, Y. Fang, Q. Chen, and X. Shao Electrochim. Acta 56 2011 3170
26. N. Zhao, F. Shi, Z. Wang, and X. Zhang Langmuir 21 2005 4713
27. A. Radisic, P.M. Vereecken, J.B. Hannon, P.C. Searson, and F.M. Ross Nano Lett. 6 2006 238
28. J. Bian, Z. Li, Z. Chen, X. Zhang, Q. Li, S. Jiang, J. He, and G. Han Electrochim. Acta 67 2012 12
29. R.M. Penner J. Phys. Chem. B 105 2001 8672
30. J. Bian, Z. Li, Z. Chen, H. He, X. Zhang, X. Li, and G. Han Appl. Surf. Sci. 258 2011 1831
31. S.J. Lee, and K. Kim Chem. Commun. 2003 212
32. J. Zhang, X. Li, X. Sun, and Y. Li J. Phys. Chem. B 109 2005 12544
33. Y. Song, and H.E. Elsayed-Ali Appl. Surf. Sci. 256 2010 5961
34. P. Hildebrandt, and M. Stockburge J. Phys. Chem. 88 1984 5935