Systematically controlling Kapitza conductance via chemical etching

Applied Physics Letters

Volumn 100, Issue 11, 2012, Pages

  Duda, John C ^a,b   Hopkins, Patrick E ^a  

^a University of Virginia   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM DEPOSITION; ALUMINUM FILM; CHEMICAL ETCHING; CONTROLLING INTERFACES; ETCHING PROCESS; KAPITZA CONDUCTANCE; ROBUST TECHNIQUE; SILICON SUBSTRATES; THERMAL INTERFACES; THERMAL RESISTOR; THERMAL TRANSPORT; TIME DOMAIN THERMOREFLECTANCE;

ALUMINUM COATINGS; ETCHING; GROWTH (MATERIALS); TIME DOMAIN ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

INTERFACES (MATERIALS);

EID: 84859974359     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3695058     Document Type: Article

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