TiO2:(Fe, S) thin films prepared from complex precursors by CVD, physical chemical properties, and photocatalysis

International Journal of Photoenergy

Volumn 2012, Issue , 2012, Pages

  Bessergenev, V G ^a   Mateus, M C ^a   Vasconcelos, D A ^a   Mariano, J F M L ^a   Botelho Do Rego, A M ^b   Lange, R ^c   Burkel, E ^c  

^a UNIVERSITY OF ALGARVE   (Portugal)

^b Centro de Quimica Fisica Molecular   (Portugal)

^c UNIVERSITY OF ROSTOCK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; FLOW OF GASES; IRON COMPOUNDS; MOLECULAR BEAMS; PHOTOCATALYSIS; THIN FILMS; VOLATILE ORGANIC COMPOUNDS;

COMPLEX PRECURSORS; FLOW REGIMES; IN-VACUUM; PHOTOCATALYTIC PROPERTY; PHYSICAL-CHEMICAL PROPERTIES; S THIN FILMS; S-DOPED; TIO 2 FILMS; TIO 2 THIN FILM; VOLATILE COMPOUNDS;

TITANIUM DIOXIDE;

EID: 84859765869     PISSN: 1110662X     EISSN: 1687529X     Source Type: Journal    
DOI: 10.1155/2012/767054     Document Type: Article

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