SCOPUS 정보 검색 플랫폼

Volumn 3, Issue 5, 2012, Pages 1531-1540

Kinetics and mechanism of metal-organic framework thin film growth: Systematic investigation of HKUST-1 deposition on QCM electrodes

(5) Stavila, Vitalie a Volponi, Joanne a Katzenmeyer, Aaron M a Dixon, Matthew C b Allendorf, Mark D a

a SANDIA NATIONAL LABORATORIES (United States)

b Biolin Scientific Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; COPPER IONS; ETHANOLIC SOLUTION; FILM CRYSTALLINITY; FUNCTIONALIZED; GRAZING INCIDENCE; GROWTH STEPS; HIGH SENSITIVITY; IN-SITU; IN-SITU MONITORING; KINETIC MODELS; KINETICS AND MECHANISM; METAL ORGANIC FRAMEWORK; REAL TIME; REFLECTION-ABSORPTION IR SPECTROSCOPY; STEP-BY-STEP; SYSTEMATIC INVESTIGATIONS; TEMPERATURE RANGE; THERMALLY ACTIVATED; TRANSITION STATE; XRD;

ACTIVATION ENERGY; ALUMINA; DEPOSITION; DEPOSITION RATES; ELECTRODES; GOLD COATINGS; GOLD DEPOSITS; GROWTH KINETICS; JAVA PROGRAMMING LANGUAGE; KINETICS; METAL IONS; QUARTZ CRYSTAL MICROBALANCES; RATE CONSTANTS; REACTION KINETICS; SELF ASSEMBLED MONOLAYERS; SILICA; SURFACE PROPERTIES;

FILM GROWTH;

EID: 84859305877 PISSN: 20416520 EISSN: 20416539 Source Type: Journal
DOI: 10.1039/c2sc20065a Document Type: Article

Times cited : (165)

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