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Volumn 407, Issue 10, 2012, Pages 1481-1484
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Ion implantation induced defects in ZnO
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Author keywords
Deep energy levels; IIVI semiconductors; Ion radiation effects; Point defects and defect clusters
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Indexed keywords
CAPACITANCE VOLTAGE;
CONDUCTION BAND EDGE;
DEEP DEFECTS;
DEEP ENERGY LEVELS;
DEEP-LEVEL DEFECTS;
DEPTH DISTRIBUTION;
GENERATION RATE;
II-VI SEMICONDUCTOR;
ION RADIATION EFFECTS;
LIGHT ION IRRADIATION;
POINT DEFECTS AND DEFECT CLUSTERS;
SAMPLE TEMPERATURE;
ZN IONS;
ZNO;
ZNO SINGLE CRYSTALS;
ACTIVATION ENERGY;
DEEP LEVEL TRANSIENT SPECTROSCOPY;
ION IMPLANTATION;
POINT DEFECTS;
ZINC;
ZINC OXIDE;
DEFECTS;
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EID: 84859157312
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physb.2011.09.066 Document Type: Conference Paper |
Times cited : (10)
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References (16)
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