Photonic crystal with a HfO 2 defect to improve performance of carbon nanotube based photodetectors

Proceedings of the IEEE Conference on Nanotechnology

Volumn , Issue , 2011, Pages 978-981

  Chen, Hongzhi ^a   Xi, Ning ^a   Lou, Jianyong ^b   Lai, King W C ^a   Chen, Liangliang ^a   Song, Bo ^a  

^a Michigan State University   (United States)

^b XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

1064 NM; DRILLING HOLES; FABRICATION PROCESS; FILL FACTOR; INFRARED LIGHT; INFRARED SIGNAL; LIGHT WAVELENGTHS; PARYLENES; PHOTON ABSORPTIONS; PHOTON DENSITIES; PHOTONIC CAVITIES; REFLECTIVE INDEX;

CARBON NANOTUBES; DEFECTS; FABRICATION; FUNCTIONAL MATERIALS; HAFNIUM OXIDES; NANOTECHNOLOGY; PHOTODETECTORS; PHOTONS; POINT DEFECTS; SEMICONDUCTOR QUANTUM WELLS;

PHOTONIC CRYSTALS;

EID: 84858990643     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2011.6144577     Document Type: Conference Paper

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