Layer engineering of graphene with oxygen plasma etching

Proceedings of the IEEE Conference on Nanotechnology

Volumn , Issue , 2011, Pages 1201-1204

  Rao, Fubo ^a   Li, Wen ^a   Dong, Lixin ^a  

^a Michigan State University   (United States)

Author keywords

Graphene; layer engineering; oxygen plasma etching

Indexed keywords

BI-LAYER; FEW-LAYER GRAPHENE; GRAPHENE LAYERS; GRAPHITE FLAKES; HIGHER EFFICIENCY; LAYER NUMBER; LAYER PEELING; MECHANICAL EXFOLIATION; OPTIMUM PARAMETERS; OXYGEN PLASMA ETCHING;

NANOTECHNOLOGY; PLASMA ETCHING;

GRAPHENE;

EID: 84858981554     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2011.6144481     Document Type: Conference Paper

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