Microstructure analysis of Ag films deposited by low-voltage sputtering

Thin Solid Films

Volumn 520, Issue 12, 2012, Pages 4139-4143

  Kato, Kazuhiro ^a   Omoto, Hideo ^a   Takamatsu, Atsushi ^a  

^a CENTRAL GLASS CO LTD   (Japan)

Author keywords

Ag; Film; Low emissivity coating; Low voltage sputtering; Resistivity

Indexed keywords

AG FILMS; CATHODE VOLTAGES; FLUX DENSITIES; GAS PARTICLES; LOW-EMISSIVITY COATING; LOW-VOLTAGE; MICROSTRUCTURE ANALYSIS; X-RAY DIFFRACTION MEASUREMENTS; X-RAY REFLECTIVITY MEASUREMENTS;

CATHODES; ELECTRIC CONDUCTIVITY; FILMS; MAGNETIC FLUX; MAGNETRONS; MICROSTRUCTURE; SPUTTER DEPOSITION; X RAY DIFFRACTION;

SILVER;

EID: 84858701618     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.06.051     Document Type: Conference Paper

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