Influence of cathode voltage on electrical property and crystal structure of sputter-deposited Ag thin films

Vacuum

Volumn 84, Issue 5, 2009, Pages 587-591

  Kato, Kazuhiro ^a   Omoto, Hideo ^a   Takamatsu, Atsushi ^a  

^a CENTRAL GLASS CO LTD   (Japan)

Author keywords

Ag; Backscattered Ar atoms; Low e coating; Resistivity; Sputtering; Thin film

Indexed keywords

AR ATOM; BACK-SCATTERED; E-COATING; LOW-E COATING; RESISTIVITY;

ATOMS; COATINGS; CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; GRAIN BOUNDARIES; THIN FILM DEVICES; THIN FILMS;

SILVER;

EID: 70649085147     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.06.017     Document Type: Article

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