Effects of sputtering gas pressure on electrochromic properties of Ni oxyhydroxide thin films prepared by reactive sputtering in H2O atmosphere

Japanese Journal of Applied Physics

Volumn 49, Issue 11, 2010, Pages

  Abe, Yoshio ^a   Ueta, Hideaki ^a   Obata, Takeshi ^a   Kawamura, Midori ^a   Sasaki, Katsutaka ^a   Itoh, Hidenobu ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS ELECTROLYTE; BLEACHING CYCLES; CHEMICAL COMPOSITIONS; ELECTROCHROMIC PROPERTIES; FILM DENSITY; FIRST CYCLE; OPTICAL DENSITIES; OXYHYDROXIDES; SPUTTERING GAS PRESSURE;

ELECTROCHROMIC DEVICES; ELECTROCHROMISM; POTASSIUM HYDROXIDE; THIN FILMS;

FILM PREPARATION;

EID: 79551652699     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.115802     Document Type: Article

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