Ni oxyhydroxide thin films prepared by reactive sputtering using O 2 + H2O mixed gas

Japanese Journal of Applied Physics

Volumn 48, Issue 1, 2009, Pages

  Ueta, Hideaki ^a   Abe, Yoshio ^a   Kato, Kiyohiko ^a   Kawamura, Midori ^a   Sasaki, Katsutaka ^a   Itoh, Hidenobu ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLYTES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; GASES; HYDROGEN; NICKEL; REACTIVE SPUTTERING; THIN FILMS;

AQUEOUS ELECTROLYTE SOLUTIONS; COLORATION EFFICIENCIES; FTIR; MIXED GAS; NI ATOMS; OXYHYDROXIDE; OXYHYDROXIDE FILMS; SPUTTERING GAS; SUPER CAPACITORS; VALENCE STATE;

FILM PREPARATION;

EID: 59649111266     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.015501     Document Type: Article

References (22)

1. B. E. Conway: Electrochemical Supercapacitors (Kluwer Academic, New York, 1999) p. 11.
2. C. G. Granqvist: Handbook of Inorganic Electroehromic Materials (Elsevier, Amsterdam, 1995) p. 1.
3. A. Azens, G. Vaivars, M, Veszelei, L. Kullman, and C. G. Granqvist: J. Appl. Phys. 89 (2001) 7885.
4. A. Azens, E. Avendaño, J. Backholm, L. Berggren, G. Gustavsson, R. Karmhag, G. A. Niklasson, A. Roos, and C. G. Granqvist: Mater. Sci. Eng. B 119 (2005) 214.
5. M. Chigane and M. Ishikawa: J. Electrochem. Soc. 141 (1994) 3439.
6. A. Šurca, B. Orel, B. Pihlar, and P. Bukovec: J. Electroanal. Chem. 408 (1996) 83.
7. K.-S. Ahn, Y.-C. Nah, and Y.-E. Sung: J. Appl. Phys. 92 (2002) 1268.
8. K. Yoshimura, T. Miki, and S. Tanemura: Jpn. J. Appl. Phys. 34 (1995) 2440.
9. I. Bouessay, A. Rougier, P. Poizot, J. Moscovici, A. Michalowicz, and J.-M. Tarascon: Electrochim. Acta 50 (2005) 3737.
10. M. Kitao, K. Izawa, K. Urabe, T. Komatsu, S. Kuwano, and S. Yamada: Jpn. J. Appl. Phys. 33 (1994) 6656.
11. Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, and H. Itoh: Jpn. J. Appl. Phys. 46 (2007) 777.
12. Joint Committee on Powder Diffraction Standard (JCPDS) card 47-1049.
13. Joint Committee on Powder Diffraction Standard (JCPDS) card 27-956.
14. K. L. Chopra: Thin Film Phenomena (McGraw-Hill, New York, 1969) p. 220.
15. K. Tanabe, T. Seiyama, and K. Fueki: Kinzoku Sankabutsu to Fukugo Sankabutsu (Metallic Oxides and Compound Oxides) (Kodansha, Tokyo, 1978) p. 264 [in Japanese].
16. C. Faure, Y. Borthomieu, C. Delmas, and M. Fouassier: J. Power Sources 36 (1991) 113.
17. Joint Committee on Powder Diffraction Standard (JCPDS) card 6-141.
18. Y. Abe, S.-H. Lee, E. O. Zayim, C. E. Tracy, J. R. Pitts, and S. K. Deb: Jpn. J. Appl. Phys. 45 (2006) 7780.
19. K.-S. Ahn, Y.-C. Nah, and Y.-E. Sung: Appl. Surf. Sci. 199 (2002) 259.
20. M. Martini, G. E. S. Brito, M. C. A. Fantiti, A. F. Craievich, and A. Gorenstein: Electrochim. Acta 46 (2001) 2275.
21. J. Arakaki, R. Reyes, M. Horn, and W. Estrada: Sol. Energy Mater. Sol. Cells 37 (1995) 33.
22. R. S. Conell, D. A. Corrigan, and B. R. Powell: Sol. Energy Mater. Sol. Cells 25 (1992) 301.