Probing the halide-metal interaction by monolayer metal deposition at the electrochemical interface

Journal of Physical Chemistry C

Volumn 116, Issue 10, 2012, Pages 6283-6288

  Gründer, Yvonne ^a   Thompson, Paul ^b   Brownrigg, Alex ^b   Darlington, Michael ^b   Lucas, Christopher A ^b  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ADLAYERS; AG/AGCL; ATOMIC LAYER; ELECTROCHEMICAL INTERFACE; ELECTRODE SURFACES; HALIDE ADSORPTION; IN-SITU; METAL DEPOSITION; METAL SUBSTRATE; POTENTIAL RANGE; POTENTIAL-DEPENDENT; STRUCTURE FORMATIONS; SURFACE X-RAY DIFFRACTION; UNDERPOTENTIAL DEPOSITION; X-RAY DIFFRACTION MEASUREMENTS;

ADSORPTION; CHEMICAL PROPERTIES; ELECTRODES; GOLD COATINGS; MONOLAYERS; X RAY DIFFRACTION;

METAL HALIDES;

EID: 84858315135     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp211800d     Document Type: Article

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