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Volumn 30, Issue 1, 2012, Pages

Influence of substrate bias voltage on the physical, electrical and dielectric properties of RF magnetron sputtered TiO 2 films

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPE (AFM); CAPACITANCE VOLTAGE; DEPOSITED FILMS; ELECTRICAL AND DIELECTRIC PROPERTIES; ELECTRICAL CONDUCTION; HIGH DIELECTRIC CONSTANTS; HIGH REFRACTIVE INDEX; P-TYPE SILICON; POTENTIAL APPLICATIONS; PROFILOMETERS; RF MAGNETRON SPUTTERING TECHNIQUE; RF MAGNETRONS; SUBSTRATE BIAS VOLTAGES; THIN-FILM CAPACITORS; TIO;

EID: 84858213569     PISSN: 17578981     EISSN: 1757899X     Source Type: Conference Proceeding    
DOI: 10.1088/1757-899X/30/1/012005     Document Type: Conference Paper
Times cited : (9)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.