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Volumn 30, Issue 1, 2012, Pages
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Influence of substrate bias voltage on the physical, electrical and dielectric properties of RF magnetron sputtered TiO 2 films
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPE (AFM);
CAPACITANCE VOLTAGE;
DEPOSITED FILMS;
ELECTRICAL AND DIELECTRIC PROPERTIES;
ELECTRICAL CONDUCTION;
HIGH DIELECTRIC CONSTANTS;
HIGH REFRACTIVE INDEX;
P-TYPE SILICON;
POTENTIAL APPLICATIONS;
PROFILOMETERS;
RF MAGNETRON SPUTTERING TECHNIQUE;
RF MAGNETRONS;
SUBSTRATE BIAS VOLTAGES;
THIN-FILM CAPACITORS;
TIO;
ATOMIC FORCE MICROSCOPY;
BIAS VOLTAGE;
DIELECTRIC MATERIALS;
DIELECTRIC PROPERTIES;
MAGNETRON SPUTTERING;
NANOSTRUCTURES;
OPTICAL COATINGS;
OXIDE FILMS;
RAMAN SPECTROSCOPY;
REFRACTIVE INDEX;
SILICON;
SUBSTRATES;
THIN FILM CIRCUITS;
TITANIUM;
TITANIUM DIOXIDE;
CURRENT VOLTAGE CHARACTERISTICS;
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EID: 84858213569
PISSN: 17578981
EISSN: 1757899X
Source Type: Conference Proceeding
DOI: 10.1088/1757-899X/30/1/012005 Document Type: Conference Paper |
Times cited : (9)
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References (11)
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