Characterization and comparison of silicon nitride films deposited using two novel processes

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 2, 2012, Pages

  Sharma, Vivek ^a   Bailey, Adam ^a   Dauksher, Bill ^a   Tracy, Clarence ^a   Bowden, Stuart ^a   O'Brien, Barry ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE SILICON SOLAR CELLS; DEPOSITION PROCESS; ELASTIC RECOIL DETECTION; FILM PROPERTIES; FTIR; HYDROGENATED SILICON; IN-PROCESS; MATERIAL CHARACTERIZATIONS; NOVEL PROCESS; PARAMETER SPACES; PASSIVATING LAYER; SI-H BONDS; SILICON NITRIDE FILM; SOLAR CELL FABRICATION; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

ANTIREFLECTION COATINGS; REFLECTION; SILICON; SPECTROSCOPIC ELLIPSOMETRY;

SILICON NITRIDE;

EID: 84858066250     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3687423     Document Type: Article

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