Metastable Au xRh 100-x thin films prepared by pulsed laser deposition for the electrooxidation of methanol

Journal of Physical Chemistry C

Volumn 116, Issue 8, 2012, Pages 5262-5269

  Imbeault, Régis ^a   Reyter, David ^a   Garbarino, Sébastien ^a   Roué, Lionel ^a   Guay, Daniel ^a  

^a INRS EMT   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AU SURFACES; BINARY PHASE DIAGRAMS; CORE-LEVEL PEAKS; CROSSED BEAMS; DEPOSITION CONDITIONS; DIFFERENT SUBSTRATES; ELECTROCATALYTIC ACTIVITY; ENERGY DIFFERENCES; FCC PHASE; LINEAR SWEEP VOLTAMMETRY; METHANOL CONCENTRATION; METHANOL OXIDATION; POTENTIAL REGION; SURFACE ALLOYS; XRD PATTERNS;

BINDING ENERGY; CATALYST ACTIVITY; ELECTROOXIDATION; FILM PREPARATION; METHANOL; OXIDATION; PHASE DIAGRAMS; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

RHODIUM;

EID: 84857718942     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp2124982     Document Type: Article

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