Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films

Applied Physics Letters

Volumn 100, Issue 5, 2012, Pages

  Prokes, S M ^a   Glembocki, O J ^a   Cleveland, Erin ^a,c   Caldwell, Josh D ^a   Foos, Edward ^a   Niinistö, Jaakko ^b   Ritala, Mikko ^b  

^a NAVAL RESEARCH LABORATORY   (United States)

^b UNIVERSITY OF HELSINKI   (Finland)

^c ASEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AG FILMS; AIR-GAPS; ELECTROMAGNETIC FIELD SIMULATION; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; PLASMONIC; PLASMONIC PROPERTIES; PLASMONICS;

ATOMIC LAYER DEPOSITION; ELECTROMAGNETIC FIELDS; METAMATERIALS; MICROSTRUCTURE; PLASMONS; THIN FILMS;

SILVER;

EID: 84857025659     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3679106     Document Type: Article

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