Nanofabrication of doped, complex oxides

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 30, Issue 1, 2012, Pages

  Waller, Gordon H ^a   Stein, Aaron ^b   Abiade, Jeremiah T ^c  

^a Virginia Polytechnic Institute and State University   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c University of Illinois at Chicago   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON SPECTROSCOPY; ESTERS; ORGANIC SOLVENTS; PHOTORESISTS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

COMPLEX OXIDES; CONVENTIONAL METHODS; CRYSTALLINITIES; HIGH TEMPERATURE; INERT MATERIALS; ION CONDUCTING ELECTROLYTES; NANO SCALE; NANOSTRUCTURED OXIDES; NB-DOPED SRTIO; ROOM TEMPERATURE; THERMOELECTRIC MATERIAL; THIN FILM OXIDES; WIDE BAND GAP;

NANOTECHNOLOGY;

EID: 84856616949     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3669645     Document Type: Article

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