Femtosecond laser delamination of thin transparent layers from semiconducting substrates [Invited]

Optical Materials Express

Volumn 1, Issue 4, 2011, Pages 543-550

  Rublack, Tino ^a   Seifert, Gerhard ^a  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION PROCESS; ABLATION THRESHOLDS; DAMAGE-FREE; FS LASER PULSE; LASER LIGHTS; LASER WAVELENGTH; PHOTON ENERGY; PULSE DURATIONS; SEMICONDUCTING SUBSTRATES; SEMICONDUCTOR BAND GAP; TRANSPARENT DIELECTRIC LAYERS; TRANSPARENT LAYERS;

ABLATION; ATOMIC FORCE MICROSCOPY; DELAMINATION; SEMICONDUCTOR LASERS; SILICON OXIDES; ULTRASHORT PULSES;

SILICON WAFERS;

EID: 84856315267     PISSN: None     EISSN: 21593930     Source Type: Journal    
DOI: 10.1364/OME.1.000543     Document Type: Article

References (17)

1. B. N. Chichkov, C. Momma, S. Nolte, F. Alvensleben, and A. Tünnermann, "Femtosecond, picosecond and nanosecond laser ablation of solids," Appl. Phys., A Mater. Sci. Process. 63(2), 109-115 (1996).
2. B. C. Stuart, M. D. Feit, A. M. Rubenchik, B. W. Shore, and M. D. Perry, "Laser-induced damage in dielectrics with nanosecond to subpicosecond pulses," Phys. Rev. Lett. 74(12), 2248-2251 (1995).
3. D. Ashkenasi, G. Müller, A. Rosenfeld, R. Stoian, I. V. Hertel, N. M. Bulgakova, and E. E. B. Campbell, "Fundamentals and advantages of ultrafast micro-structuring of transparent materials," Appl. Phys., A Mater. Sci. Process. 77, 223-228 (2003).
4. E. N. Glezer and E. Mazur, "Ultrafast-laser driven micro-explosions in transparent materials," Appl. Phys. Lett. 71(7), 882-884 (1997).
5. K. M. Davis, K. Miura, N. Sugimoto, and K. Hirao, "Writing waveguides in glass with a femtosecond laser," Opt. Lett. 21(21), 1729-1731 (1996).
6. W. Yang, P. G. Kazansky, and Y. P. Svirko, "Non-reciprocal ultrafast laser writing," Nat. Photonics 2(2), 99-104 (2008).
7. G. D. Marshall, M. Ams, and M. J. Withford, "Direct laser written waveguide-Bragg gratings in bulk fused silica," Opt. Lett. 31(18), 2690-2691 (2006).
8. U. K. Tirlapur and K. König, "Cell biology: targeted transfection by femtosecond laser," Nature 418(6895), 290-291 (2002).
9. A. Stalmashonak, C. Matyssek, O. Kiriyenko, W. Hergert, H. Graener, and G. Seifert, "Preparing large-aspect-ratio prolate metal nanoparticles in glass by simultaneous femtosecond multicolor irradiation," Opt. Lett. 35(10), 1671-1673 (2010).
10. M. Miclea, U. Skrzypczak, F. Fankhauser, S. Faust, H. Graener, and G. Seifert, "Applanation-free femtosecond laser processing of the cornea," Biomed. Opt. Express 2(3), 534-542 (2011).
11. T. Rublack, S. Hartnauer, P. Kappe, C. Swiatkowski, and G. Seifert, "Selective ablation of thin SiO2 layers on silicon substrates by femto- and picosecond laser pulses," Appl. Phys., A Mater. Sci. Process. 103(1), 43-50 (2011).
12. 2 layers on silicon substrates," Appl. Phys., A Mater. Sci. Process. 99(1), 151-158 (2010).
13. J. M. Liu, "Simple technique for measurements of pulsed Gaussian-beam spot sizes," Opt. Lett. 7(5), 196-198 (1982).
14. T. Rublack, M. Muchow, S. Hartnauer, and G. Seifert, "Laser ablation of silicon dioxide on silicon using femtosecond near infrared laser pulses," Energy Procedia (to be published).
15. C. V. Shank, R. Yen, and C. Hirlimann, "Time-resolved reflectivity measurements of femtosecond optical-pulse-induced pase transitions in silicon," Phys. Rev. Lett. 50(6), 454-457 (1983).
16. K. Sokolowski-Tinten and D. von der Linde, "Generation of dense electron-hole plasmas in silicon," Phys. Rev. B 61(4), 2643-2650 (2000).
17. M. A. Green and M. Keevers, "Optical properties of intrinsic silicon at 300 K," Prog. Photovolt. Res. Appl. 3(3), 189-192 (1995).