Silicon electrodeposition in molten fluorides

Electrochimica Acta

Volumn 62, Issue , 2012, Pages 282-289

  Bieber, A L ^a   Massot, L ^a   Gibilaro, M ^a   Cassayre, L ^a   Taxil, P ^a   Chamelot, P ^a  

^a UNIVERSITÉ PAUL SABATIER   (France)

Author keywords

Chronoamperometry; Electrodeposition; Instantaneous nucleation; Molten fluorides; Silicon

Indexed keywords

ELECTRODEPOSITION PROCESS; MOLTEN FLUORIDE; MOLTEN FLUORIDES; NUCLEATION PROCESS; NUCLEATION SITES; OPERATING CONDITION; OVERPOTENTIAL; SILICON COATINGS; SILVER ELECTRODE; TEMPERATURE INFLUENCE; TEMPERATURE RANGE;

CHRONOAMPEROMETRY; DEPOSITS; ELECTRODEPOSITION; FLUORINE COMPOUNDS; SILICON; SUBSTRATES;

NUCLEATION;

EID: 84856227944     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.12.039     Document Type: Article

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