Niobium electrodeposition in molten fluorides using pulsed electrolysis

Journal of the Electrochemical Society

Volumn 147, Issue 11, 2000, Pages 4131-4137

  Chamelot, Pierre ^a   Taxil, Pierre ^a   Oquab, Djar ^b   Serp, Jérome ^a   Lafage, Bernard ^a  

^a UNIVERSITÉ PAUL SABATIER   (France)

^b CNRS/INPT   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHY; ELECTRIC CURRENTS; ELECTROLYSIS; ELECTROSTATIC COATINGS; MOLTEN MATERIALS; NIOBIUM DEPOSITS; PARAMETER ESTIMATION;

FLUORIDE MEDIA; PULSED ELECTROLYSIS;

ELECTRODEPOSITION;

EID: 0034319783     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1394030     Document Type: Article

References (35)

1. G. P. Capsimalis, E. S. Chen, R. E. Peterson, and I. Ahmad, J. Appl. Electrochem., 17, 253 (1987).
2. G. W. Mellors and S. Senderoff, J. Electrochem. Soc., 112, 266 (1965).
3. P. Taxil and J. Mahenc, J. Appl. Electrochem., 17, 261 (1987).
4. A. M. Emsley and M. P. Hill, J. Appl. Electrochem., 17, 283 (1987).
5. P. Taxil, Thèse d'État, Université Paul-Sabatier, Toulouse, France (1986).
6. A. Travalloni, Ph.D. Thesis, Université Pierre et Marie Curie, Paris VI, France (1978).
7. S. Senderoff and G. W. Mellors, J. Electrochem. Soc., 113, 66 (1966).
8. Z. Y. Qiao and P. Taxil, J. Appl. Electrochem., 15 259 (1985).
9. C. Decroly, A. Mukhtar, and R Winand, J. Electrochem. Soc., 115, 905 (1968).
10. U. Cohen, J. Electrochem. Soc., 128, 731 (1981).
11. U. Cohen, Thesis, Stanford University, Stanford, CA (1977).
12. E. Christensen, X. Wang, J. H. Von Barner, T. Ostford, and N. J. Bjerrum, J. Electrochem. Soc., 141, 1212 (1994).
13. M. Broc, Rapport CEA R4921, Centre d'Etude Nucléaire, Fontenay-aux-Roses (1978).
14. P. Chamelot, B. Lafage, and P. Taxil, J. Electrochem. Soc., 143, 1570 (1996).
15. N. Ibl, in Techniques de l'ingénieur, D902 (1976).
16. B. Nguyen and E. Chainet, L'actualité Chimique, 167 (July-Aug-Sept 1990).
17. J. C. Puippe, Dissertation, ETH, Zurich, Switzerland (1978).
18. J. C. Puippe and F. Leaman, in Theory and Practice of Pulse Plating, AESF Publishing, Orlando, FL (1986).
19. A. Elfrom, Ph.D. Thesis, Université Pierre et Marie Curie, Paris VI, France (1991).
20. D. Wei, M. Okido, and T. Oki, J. Appl. Electrochem., 25, 923 (1994).
21. A. Barhoun, Y. Berghoute, and F. Lantelme, J. Alloys Compd., 179, 241 (1992).
22. B. Gillesberg, J. H. Von Barner, N. J. Bjerrum, and F. Lantelme, J. Appl. Electrochem., 29, 939 (1999).
23. M. Datta and D. Landolt, J. Appl. Electrochem., 25, 97 (1985).
24. O. Chène and D. Landolt, J. Appl. Electrochem., 19, 188 (1989).
25. D. T. Chin, J. Electrochem. Soc., 130, 1657 (1983).
26. A. A. Bedrossian and H. Y. Cheh, J. Electrochem. Soc., 128, 2536 (1981).
27. P. Chamelot, Ph.D. Thesis, Université Paul-Sabatier, Toulouse, France (1994).
28. A. Robin, M. E. de Almeida, and A. F. Satori, in Mater. Sci. Forum, 73-75, 539 (1991).
29. N. Ibl, Surf. Technol., 10, 81 (1980).
30. J. C. Puippe and N. Ibl. J. Appl. Electrochem., 10, 775 (1980).
31. N. Ibl, J. C. Puippe, and H. Angerer, Surf. Technol., 6, 287 (1978).
32. P. Chamelot, P. Taxil, and B. Lafage, Electrochim. Acta, 39, 2571 (1994).
33. W. D. Powers, S. I. Cohen, and N. D. Greene, Nucl. Sci. Eng., 71, 349 (1963).
34. P. Pascal, in Nouveau Traité De Chimie Minérale, Tome XII p. 349, Masson et Cie, Paris (1958).
35. Joint Committee on Powder Diffraction Standards (JCPDS), International Center of Diffraction Data, Card no. 35-789, Swarthmore, PA (1992).