Electrocrystallisation of tantalum in molten fluoride media

Electrochimica Acta

Volumn 50, Issue 27, 2005, Pages 5408-5413

  Massot, L ^a   Chamelot, P ^a   Palau, P ^b   Taxil, P ^a  

^a LABORATOIRE DE GÉNIE CHIMIQUE   (France)

^b ALCAN INTERNATIONAL LIMITED   (Canada)

Author keywords

Chronoamperometry; Molten fluorides; Progressive nucleation; Roughness; Tantalum

Indexed keywords

ANODES; COATINGS; CRYSTALLIZATION; CURRENT DENSITY; DENSITY (SPECIFIC GRAVITY); DIFFUSION; FLUORINE COMPOUNDS; MOLTEN MATERIALS; NUCLEATION; SCANNING ELECTRON MICROSCOPY; TANTALUM;

CHRONOAMPEROMETRY; MOLTEN FLUORIDES; PROGRESSIVE NUCLEATION; TANTALUM COATINGS;

ELECTROCHEMISTRY;

EID: 24644521020     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.03.021     Document Type: Article

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