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Volumn 273, Issue , 2012, Pages 109-112
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Incorporation of N in TiO 2 films grown by DC-reactive magnetron sputtering
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Author keywords
Band gap tuning; Ion beam analysis; N doping TiO 2; Sputtering
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Indexed keywords
BAND-GAP TUNING;
CODEPOSITION;
DEPTH PROFILE;
ELECTROMAGNETIC SPECTRA;
EMERGING TECHNOLOGIES;
HEAVY-ION ELASTIC RECOIL DETECTION ANALYSIS;
INORGANIC CONTAMINANTS;
ION BEAM ANALYSIS;
N-DOPING;
NITROGEN-DOPED;
OH RADICAL;
PHOTOCATALYTIC ACTIVITIES;
PHOTOCATALYTIC PROPERTY;
RUTHERFORD BACKSCATTERING SPECTROMETRY;
SILICON SUBSTRATES;
SOLAR SPECTRUM;
TIO;
TITANIUM TARGETS;
UV-VIS SPECTROSCOPY;
VISIBLE LIGHT;
WIDE BAND GAP;
ENERGY GAP;
FREE RADICALS;
PHOTOCATALYSIS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTOR DOPING;
SPECTRUM ANALYSIS;
SPUTTERING;
TITANIUM;
ULTRAVIOLET SPECTROSCOPY;
ULTRAVIOLET VISIBLE SPECTROSCOPY;
WATER TREATMENT;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
TITANIUM DIOXIDE;
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EID: 84856116210
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2011.07.052 Document Type: Conference Paper |
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Times cited : (17)
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References (14)
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