Design and fabrication of photonic crystals in epitaxial free silicon for ultrathin solar cells

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8312, Issue , 2011, Pages

  Meng, Xianqin ^a,b,c   Depauw, Valerie ^c   Gomard, Guillaume ^a,b,c   El Daif, Ounsi ^c   Trompoukis, Christos ^c   Drouard, Emmanuel ^a,b   Fave, Alain ^a,c   Dross, Frederic ^d   Gordon, Ivan ^d   Seassal, Christian ^a,b  

^a UNIVERSITÉ DE LYON   (France)

^b ECOLE CENTRALE DE LYON   (France)

^c UNIVERSITÉ DE LYON   (France)

^d IMEC   (Belgium)

Author keywords

Epitaxial crystalline silicon; Holographic lithography; Photonic crystals; Photovoltaics; Thin film devices and applications

Indexed keywords

2-D PHOTONIC CRYSTALS; ACTIVE LAYER; CRYSTALLINE SILICONS; FABRICATION OF PHOTONIC CRYSTALS; FABRICATION PROCESS; HOLOGRAPHIC LITHOGRAPHY; OPTICAL SIMULATION; PHOTOVOLTAIC SOLAR CELLS; PHOTOVOLTAICS; ULTRA-THIN;

CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; INDUCTIVELY COUPLED PLASMA; LIGHTING; LITHOGRAPHY; PHOTOVOLTAIC EFFECTS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SOLAR ENERGY; SOLAR POWER GENERATION; THIN FILM DEVICES;

PHOTONIC CRYSTALS;

EID: 84855997950     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.904383     Document Type: Conference Paper

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