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Volumn 520, Issue 6, 2012, Pages 1988-1992
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Nitric-phosphoric acid etching effects on the surface chemical composition of CdTe thin film
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Author keywords
Atomic force microscopy; Cadmium telluride; Depth profiling; Ion sputtering; Thin films; X ray photoelectron spectroscopy
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Indexed keywords
ACID ETCHING;
AMBIENT CONDITIONS;
BACK CONTACT;
CDTE;
IN-DEPTH PROFILE;
ION SPUTTERING;
LOW RESISTANCE;
METAL ELECTRODES;
SURFACE CHEMICAL COMPOSITION;
SURFACE DEGRADATION;
XPS MEASUREMENTS;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
CADMIUM;
CADMIUM COMPOUNDS;
CADMIUM TELLURIDE;
DEPTH PROFILING;
ETCHING;
PHOSPHORIC ACID;
PHOTONS;
PHOTOVOLTAIC CELLS;
PHOTOVOLTAIC EFFECTS;
SURFACE ROUGHNESS;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
NITRIC ACID;
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EID: 84855975584
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.08.113 Document Type: Article |
Times cited : (6)
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References (19)
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