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Thin Solid Films

Volumn 520, Issue 6, 2012, Pages 2123-2127

Preparation of Al-doped ZnO thin films as transparent conductive substrate in dye-sensitized solar cell

(3) Hirahara, N a Onwona Agyeman, B a Nakao, M a

a KYUSHU INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Doped semiconductor; Solar cell; Thin films; Transparent conductive oxides

Indexed keywords

AL CONTENT; AL-CONCENTRATION; AL-DOPED ZNO; ALUMINUM CONCENTRATION; ALUMINUM-DOPED ZINC OXIDE; ARGON GAS; AZO FILMS; AZO THIN FILMS; DOPED-SEMICONDUCTOR; DYE-SENSITIZED SOLAR CELL; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL ENERGY; GLASS SUBSTRATES; POST ANNEALING TREATMENT; RF MAGNETRON SPUTTERING TECHNIQUE; SIMULATED SUNLIGHT; TRANSPARENT CONDUCTIVE; TRANSPARENT CONDUCTIVE OXIDES; TRANSPARENT SUBSTRATE; ZNO CERAMIC; ZNO FILMS;

ALUMINUM; ARGON; CONDUCTIVE FILMS; CONVERSION EFFICIENCY; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; PHOTOELECTROCHEMICAL CELLS; SOLAR CELLS; SOLAR ENERGY; SUBSTRATES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; ZINC OXIDE;

FILM PREPARATION;

EID: 84855940218 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.08.100 Document Type: Article

Times cited : (41)

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