An electrochemical approach to fabricate a heterogeneous mixed monolayer on planar polycrystalline Au and its characterization with Lateral Force Microscopy

Journal of Electroanalytical Chemistry

Volumn 666, Issue , 2012, Pages 76-84

  Smith, Scott R ^a,b   Han, Sungwon ^a   McDonald, Andy ^a   Zhe, William ^a   Shepherd, Jeffrey L ^a  

^a LAURENTIAN UNIVERSITY   (Canada)

^b UNIVERSITY OF GUELPH   (Canada)

Author keywords

11 Mercaptoundecanoic acid (MUA); 2 Aminoethane thiol (AET); Electron Backscattered Diffraction (EBSD); Lateral Force Microscopy (LFM); Mixed monolayer; Selective reductive desorption

Indexed keywords

ADSORPTION; CAPACITANCE MEASUREMENT; CHARACTERIZATION; CRYSTALLOGRAPHY; CYCLIC VOLTAMMETRY; DESORPTION; ELECTRON DIFFRACTION; SELF ASSEMBLED MONOLAYERS;

11-MERCAPTOUNDECANOIC ACID; 2-AMINOETHANE THIOL (AET); ELECTRON BACKSCATTERED DIFFRACTION (EBSD); LATERAL FORCE MICROSCOPY (LFM); MIXED MONOLAYER; REDUCTIVE DESORPTION;

ELECTROCHEMICAL ELECTRODES;

EID: 84855867232     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2011.12.007     Document Type: Article

References (46)

1. E. Gomar-Nadal, J. Puigmarti-Luis, and D.B. Amabilino Chem. Soc. Rev. 37 2008 490 504
2. R.G. Nuzzo, and D.L. Allara J. Am. Chem. Soc. 105 1983 4481 4483
3. J.C. Love, L.A. Estroff, J.K. Kriebel, R.G. Nuzzo, and G.M. Whitesides Chem. Rev. (Washington, DC) 105 2005 1103 1169
4. J.J. Gooding, F. Mearns, W. Yang, and J. Liu Electroanalysis 15 2003 81 96
5. A. Ulman Chem. Rev. (Washington, DC) 96 1996 1533 1554
6. C. Vericat, M.E. Vela, G. Benitez, P. Carro, and R.C. Salvarezza Chem. Soc. Rev. 39 2010 1805 1834
7. P. Chinwangso, A.C. Jamison, and T.R. Lee Acc. Chem. Res. 44 2011 511 519
8. J. Zhang, A.C. Welinder, Q. Chi, and J. Ulstrup Phys. Chem. Chem. Phys. 13 2011 5526 5545
9. M. Brust, M. Walker, D. Bethell, D.J. Schiffrin, and R. Whyman J. Chem. Soc. Chem. Commun. 1994 801 802
10. A.C. Templeton, W.P. Wuelfing, and R.W. Murray Acc. Chem. Res. 33 2000 27 36
11. I. Gofberg, and D. Mandler J. Nanopart. Res. 12 2010 1807 1811
12. A.S. de Dios, and M.E. Díaz-García Anal. Chim. Acta. 666 2010 1 22
13. A.M. Jackson, Y. Hu, P.J. Silva, and F. Stellacci J. Am. Chem. Soc. 128 2006 11135 11149
14. R. Tarnawski, and M. Ulbricht Colloid Surf. A 374 2011 13 21
15. J.M. Bergen, H.A. von Recum, T.T. Goodman, A.P. Massey, and S.H. Pun Macromol. Biosci. 6 2006 506 516
16. X. Liu, Y. Hu, and F. Stellacia Small 7 14 2011 1961 1966
17. D.M. Lemay, and J.L. Shepherd Electrochim. Acta 54 2008 388 393
18. S. Abraham John, and T. Sagara J. Electroanal. Chem. 633 2009 175 181
19. C.J. Zhong, W.X. Zheng, and F.L. Leibowitz Electrochem. Commun. 1 1999 72 77
20. C.R. Raj, A.I. Abdelrahman, and T. Ohsaka Electrochem. Commun. 7 2005 888 893
21. L. Wang, J. Bai, P. Huang, H. Wang, L. Zhang, and Y. Zhao Electrochem. Commun. 8 2006 1035 1040
22. D. Qu, B. Kim, C.J. Lee, M. Ito, H. Noguchi, and K. Uosaki J. Phys. Chem. C 114 2010 497 505
23. D. García-Raya, R. Madueńo, M. Blázquez, and T. Pineda J. Phys. Chem. C 114 2010 3568 3574
24. S. Rifai, M. Laferrire, D. Qu, D.D.M. Wayner, C.P. Wilde, and M. Morin J. Electroanal. Chem. 531 2002 111 118
25. R.K. Smith, P.A. Lewis, and P.S. Weiss Prog. Surf. Sci. 75 2004 1 68
26. M. Satjapipat, R. Sanedrin, and F. Zhou Langmuir 17 2001 7637 7644
27. D. Hobara, T. Sasaki, S. Imabayashi, and T. Kakiuchi Langmuir 15 1999 5073 5078
28. K. Arihara, T. Ariga, N. Takashima, K. Arihara, T. Okajima, and F. Kitamura Phys. Chem. Chem. Phys. 5 2003 3758 3761
29. J.L. Shepherd, A. Kell, E. Chung, C.W. Sinclar, M.S. Workentin, and D. Bizzotto J. Am. Chem. Soc. 126 2004 8329 8335
30. O.Y.F. Henry, A. Maliszewska, and C.K. O'Sullivan Electrochem. Commun. 11 2009 664 667
31. J. Strutwolf, and C.K. O'Sullivan Electroanalysis 19 2007 1467 1475
32. T. Laredo, J. Leitch, M. Chen, I.J. Burgess, J.R. Dutcher, and J. Lipkowski Langmuir 23 2007 6205 6211
33. A. Badia, S. Arnold, V. Scheumann, M. Zizlsperger, J. Mack, and G. Jung Sens. Actuators B 54 1999 145 165
34. D. Qu, and M. Morin J. Electroanal. Chem. 517 2001 45 53
35. J. Cho, H. Ha, and K. Oh Metall. Mater. Trans. A 36 2005 3415 3425
36. Y. Kim, J.P. Koo, and J.S. Ha Thin Solid Films 479 2005 277 281
37. D. Bizzotto, and A. Nelson Langmuir 14 1998 6269 6273
38. J.L. Shepherd, and D. Bizzotto Langmuir 22 2006 4869 4876
39. J. Shepherd, Y. Yang, and D. Bizzotto J. Electroanal. Chem. 524-525 2002 54 61
40. A. Chen, and J. Lipkowski J. Phys. Chem. B 103 1999 682 691
41. A. Kudelski, and W. Hill Langmuir 15 1999 3162 3168
42. C. Zhong, and M.D. Porter J. Electroanal. Chem. 425 1997 147 153
43. D. Yang, H. Al-Maznai, and M. Morin J. Phys. Chem. B 101 1997 1158 1166
44. M. Byloos, H. Al-Maznai, and M. Morin J. Phys. Chem. B 103 1999 6554 6561
45. D. Bizzotto, and J.L. Shepherd Epi-fluorescence microscopy studies of potential controlled changes in adsorbed thin organic films at electrode surfaces Adv. Elect. Sci. Eng. 9 2006 97 126
46. Y. Yang, and D. Bizzotto J. Electroanal. Chem. 500 2001 408 417