Fractional surface termination of diamond by electrochemical oxidation

Langmuir

Volumn 28, Issue 1, 2012, Pages 47-50

  Hoffmann, René ^a   Obloh, Harald ^a   Tokuda, Norio ^b,c   Yang, Nianjun ^a   Nebel, Christoph E ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

^b KANAZAWA UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; BIOINTERFACES; CRYSTALLINE FORM; NANO-METER SCALE; SURFACE TERMINATION;

DIAMONDS; ELECTROCHEMISTRY;

ELECTROCHEMICAL OXIDATION;

DIAMOND;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTROCHEMISTRY; METHODOLOGY; OXIDATION REDUCTION REACTION; SURFACE PROPERTY;

DIAMOND; ELECTROCHEMISTRY; MICROSCOPY, ATOMIC FORCE; OXIDATION-REDUCTION; SURFACE PROPERTIES;

EID: 84855687148     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la2039366     Document Type: Article

References (25)

1. McCreery, R. L. Chem. Rev. 2008, 108, 2646-2687
2. Kraft, A. Int. J. Electrochem. Sci. 2007, 2, 355-385
3. Swain, G. M.; Anderson, A. B.; Angus, J. C. MRS Bull. 1998, 23, 56-60
4. Swain, G. M. J. Electrochem. Soc. 1994, 141, 3382-3393
5. Granger, M. C.; Witek, M.; Xu, J. S.; Wang, J.; Hupert, M.; Hanks, A.; Koppang, M. D.; Butler, J. E.; Lucazeau, G.; Mermoux, M.; Strojek, J. W.; Swain, G. M. Anal. Chem. 2000, 72, 3793-3804
6. Actis, P.; Denoyelle, A.; Boukherroub, R.; Szunerits, S. Electrochem. Commun. 2008, 10, 402-406
7. Tryk, D. A.; Tachibana, H.; Inoue, H.; Fujishima, A. Diamond Relat. Mater. 2007, 16, 881-887
8. Szunerits, S.; Manesse, M.; Actis, P.; Marcus, B.; Denuault, G.; Jama, C.; Boukherroub, R. Electrochem. Solid State Lett. 2007, 10, G43-G46
9. Hees, J.; Hoffmann, R.; Kriele, A.; Smirnov, W.; Obloh, H.; Glorer, K.; Raynor, B.; Driad, R.; Yang, N.; Williams, O. A.; Nebel, C. E. ACS Nano 2011, 5, 3339-3346
10. Geisler, M.; Hugel, T. Adv. Mater. 2010, 22, 398-402
11. Vanhove, E.; Sanoit, J. d.; Arnault, J. C.; Saada, S.; Mer, C.; Mailley, P.; Bergonzo, P.; Nesladek, M. Phys. Status Solidi A 2007, 204, 2931-2939
12. Hoffmann, R.; Kriele, A.; Obloh, H.; Hees, J.; Wolfer, M.; Smirnov, W.; Yang, N.; Nebel, C. E. Appl. Phys. Lett. 2010, 97, 052103-052103
13. DeClements, R.; Swain, G. M. J. Electrochem. Soc. 1997, 144, 856-866
14. Denisenko, A.; Pietzka, C.; Romanyuk, A.; El-Hajj, H.; Kohn, E. J. Appl. Phys. 2008, 103, 014904
15. Goeting, C. H.; Marken, F.; Gutierrez-Sosa, A.; Compton, R. G.; Foord, J. S. Diamond Relat. Mater. 2000, 9, 390-396
16. Notsu, H.; Yagi, I.; Tatsuma, T.; Tryk, D. A.; Fujishima, A. J. Electroanal. Chem. 2000, 492, 31-37
17. Hoffmann, R.; Kriele, A.; Obloh, H.; Tokuda, N.; Smirnov, W.; Yang, N.; Nebel, C. E. Biomaterials 2011, 32, 7325-7332
18. Tokuda, N.; Umezawa, H.; Yamabe, K.; Okushi, H.; Yamasaki, S. Jpn. J. Appl. Phys. 2007, 46, 1469-1470
19. Cardon, F.; Gomes, W. P. J. Phys. D: Appl. Phys. 1978, 11, L63-L67
20. Shirley, D. A. Phys. Rev. B 1972, 5, 4709
21. Wojdyr, M. J. Appl. Crystallogr. 2010, 43, 1126-1128
22. Wang, J.; Firestone, M. A.; Auciello, O.; Carlisle, J. A. Langmuir 2004, 20, 11450-11456
23. Uetsuka, H.; Shin, D.; Tokuda, N.; Saeki, K.; Nebel, C. E. Langmuir 2007, 23, 3466-3472
24. Yang, N. J.; Yu, J. H.; Uetsuka, H.; Nebel, C. E. Electrochem. Commun. 2009, 11, 2237-2240
25. Granger, M. C.; Swain, G. M. J. Electrochem. Soc. 1999, 146, 4551-4558