RBS, XRR and optical reflectivity measurements of Ti-TiO 2 thin films deposited by magnetron sputtering

Materials Research Bulletin

Volumn 47, Issue 2, 2012, Pages 296-301

  Drogowska, K ^a,d   Tarnawski, Z ^a   Brudnik, A ^a   Kusior, E ^a   Sokolowski M ^a   Zakrzewska, K ^a   Reszka, A ^b   Kim Ngan, N T H ^c   Balogh, A G ^d  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

^b INSTITUTE OF PHYSICS   (Poland)

^c PEDAGOGICAL UNIVERSITY   (Poland)

^d DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

A. Multilayers; B. Sputtering; C. X ray diffraction; D. Crystal structure; Optical properties

Indexed keywords

BULK VALUE; CHEMICAL COMPOSITIONS; COLUMNAR GROWTH; COMBINED ANALYSIS; COMPLEMENTARY METHODS; CROSS SECTIONAL IMAGE; CRYSTALLOGRAPHIC STRUCTURE; DENSITY EVALUATION; DEPTH PROFILE; FILM DENSITY; GLANCING INCIDENCE; LAYER THICKNESS; NOMINAL THICKNESS; OPTICAL REFLECTIVITY; PULSED MAGNETRON SPUTTERING; REFLECTIVITY SPECTRA; SEM STUDY; SI (1 1 1); TIO; X-RAY REFLECTOMETRY;

FILM PREPARATION; MULTILAYERS; OPTICAL PROPERTIES; REFLECTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

CRYSTAL STRUCTURE;

EID: 84855665218     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2011.11.026     Document Type: Article

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