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Journal of Materials Science

Volumn 47, Issue 3, 2012, Pages 1348-1353

Preparation and characterisation of chromium-doped cobalt oxide spinel thin films

(4) Vannier, V a Schenk, M a Kohse Hoinghaus K a Bahlawane, N a,b

a BIELEFELD UNIVERSITY (Germany)

b LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (Luxembourg)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAP ENERGY; CATALYTIC REACTIVITY; CATIONIC SITES; CHEMICAL VAPOUR DEPOSITION; COBALT OXIDES; CR-DOPING; EFFECT OF DOPING; ELECTRICAL CONDUCTIVITY; OPTICAL AND ELECTRICAL PROPERTIES; OXIDE SPINELS; SPRAY EVAPORATION;

CATALYTIC OXIDATION; CHEMICAL VAPOR DEPOSITION; CHROMIUM; COBALT; DEPOSITION; DICHLOROMETHANE; ELECTRIC CONDUCTIVITY; OXIDE FILMS; SEMICONDUCTOR DOPING; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

FILM PREPARATION;

EID: 84855487256 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-011-5909-6 Document Type: Article

Times cited : (25)

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